Plan achromatic optics and Epi Kohler illumination system and anti-reflective structure in the epi-illumination system can make the image clarity better contrast of field of view. And effectively prevent interference by stray light.

The stable and reliable operating mechanism provides a clearer image and easier to operate. A modular microscope body with a new ergonomic design, structural symmetry, can use with many kinds of accessories. Stage, light intensity, and low position coarse and fine adjustment increased comfort of operating. Widely used in various types of semiconductor silicon wafer inspection, material- s science study, geology mineral analysis, and precision engineering, and other disciplines.

As an upgraded metallurgical microscope, CX40M re-optimized the performance by integrating the advantages of our marketable products ‘XYM’&’MX4R’ and the innovations of our new product ‘RX50M’ with marketing demand. With excellent imaging performance and comfortable operating experience, CX40M provides high cost-effective solution for metallographic analysis and industrial inspection.

With higher color correction and better coating design, new improved LMPlan series objectives enhance the image resolution and color reducibility.With the most suitable viewing degree, 30°inclined head holds everyone in the best working state, less tension and fatigue. You can adjust the interpupillary distance to optimum according to the scale on viewing head.

Reflected illuminator with field/aperture diaphragm and oblique light device, as well as slots for polarizing kit and filters, adopts LED Koehler illumination system.Comparing with other LED, single 5W LED with warm white light (3000-3300K) reduces the fatigue on observer's vision at the extreme.

With pull-rod devices for adjusting the centers of field and aperture diaphragm, stray light can be eliminated by expanding or shrink the illumination zone.Simple polarizing observation is available with pluggable polarizer kit. More ideal images are here with different filters.

The highest sample can be tested is 28mm with transmitted & reflected frame while 78mm high sample is available with reflected frame, as the stage can be dropped 50mm by loosening the screw in the stage holder.M4 wrench for socket head screws places in the frame, making the best of the available space and improving your working efficiency.

Up-limit device is helpful to avoid the damage caused by impact between sample and objective.Using the outstanding condenser system of New designed RX50M, much more transmitted light can be through with bigger numerical aperture and stronger intensity.

Bright field, oblique light and simple polarizing are all available with CX40M. Brightfield image with high brightness and high resolution shows original color of samples. And oblique light is used to show 3D relief image.

Professional metallurgical objective and plan eyepiece provide clear image, high resolution, comfortable observation.

Superior image and reliable mechanical structure.

With the corresponding photo or video accessories, can collect and preserve the image, with computers and specialized metallographic analysis software can analysis the metallographic image.

Easy to operate, Have all kinds of accessories. Widely used in teaching and research metallographic analysis, semiconductor silicon wafer inspection, geology mineral analysis, precision engineering and surveying fields.

Adhering to the philosophy of "continuous exploration & self-transcending" for Ootscopes brand, new RX50M metallurgical microscope for research with a number of pioneering design in appearance and functions, is born to provide a perfect detection solution and develop a new pattern of industrial field.

RX50M viewing head is designed of multiple options for splitting ratio. with wide beam imaging system, 26.5mm super wide filed of view is available.

Trinocular head with erect image, splitting ratio Binocular:Trinocular= 100:0 or 0:100. The moving direction of samples is as the same as observed.

Trinocular head with inverted image, splitting ratio Binocular: Trinocular=100:0 or 20:80 or 0:100. Except for concentrating 100% light to eyepiece tube or camera tube, there is another option with 20% light to eyepiece tube and 80% to camera tube, so that eyepiece observation and image output can be available at the same time.

Polarization system The polarizer and analyzer in polarization system contribute to eliminate the stray light in semiconductor and PCB detection, image with clear detail is achievable. There are fixed analyzer and rotatable analyzer for option. The sample can be observed at different polarizing angles with 360° rotatable analyzer. Besides, this polarization system can be upgraded to Nomarski differential interference contrast system after installing a new developed DIC attachment.

Nomarski differential interference contrast system The weeny asperities on the surface which can not be found in bright field, is able to be detected by using U-DICR attachment to create high contrast background. It is widely used for testing the conductive particle of LCD, surface scratch of precision disk.

Linkage between the neutral density filter and the switch for BF & DF The lever in front of illuminator is used to switch between bright field and dark field, and it is in tandem with a neutral density filter (ND50). When you switch from DF to BF, the built-in ND50 filter takes the role to decay the light intensity. More scientific and more comfortable.

Provide superior image and reliable mechanical structure? Easy operating?various of accessories, widely used in teaching and research metallographic analysis and facility materials testing.

ICX41M with new designed infinity optical system, can be applied for industry research as forging, smelting, heat treatment, and inspection of raw material.